Handbook of Cleaning in Semiconductor Manufacturing – Fundamental and Applicati…
Handbook for Cleaning for Semiconductor ManufacturingFundamentals and Applications\nAuthor(s): Karen A. Reinhardt, Richard F. Reidy\nFormat: Hardback\nPublisher: John Wiley & Sons Inc, United States\nImprint: Wiley-Scrivener\nISBN-13: 9780470625958, 978-0470625958\nSynopsis\nProvides an In-depth discussion of surface conditioning for semiconductor applications The Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications provides an in-depth discussion of surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet processing is reviewed as well as surface and colloidal aspects of cleaning and etching. Topics covered in this new reference include:\nFront end line (FEOL) and back end of line (BEOL) cleaning applications such as high-k/metal gate post-etch cleaning and pore sealing, high-dose implant stripping and cleaning, and germanium, and silicon passivation Formulation development practices, methodol.
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