Machine Learning-Based Modelling in Atomic Layer Deposition P... - 9781032386706

Machine Learning-Based Modelling in Atomic Layer Deposition ProcessesAuthor(s): Oluwatobi Adeleke, Sina Karimzadeh, Tien-Chien Jen\nFormat: Hardback\nPublisher: Taylor & Francis Ltd, United Kingdom\nImprint: CRC Press\nISBN-13: 9781032386706, 978-1032386706\nSynopsis\nWhile thin film technology has benefited greatly from artificial intelligence (AI) and machine learning (ML) techniques, there is still much to be learned from a full-scale exploration of these technologies in atomic layer deposition (ALD). This book provides in-depth information regarding the application of ML-based modeling techniques in thin film technology as a standalone approach and integrated with the classical simulation and modeling methods. It is the first of its kind to present detailed information regarding approaches in ML-based modeling, optimization, and prediction of the behaviors and characteristics of ALD for improved process quality control and discovery of new materials. As such, this book fills .